CD-SEM Technologies for 65-nm Process Node
نویسندگان
چکیده
OVERVIEW: Improved measurement repeatability of new CD-SEM systems for the 65-nm node has increased demand for ways to deal with pattern roughness and other new issues that have emerged as device feature sizes have continued to shrink. Hitachi Group’s newest generation CD-SEM developed for the 65-nm node and beyond, is now available. A range of elemental technologies are now under investigation to derive the full performance benefits from the new system and to deal with finer feature size processes. Atsuko Yamaguchi, Dr. Sci. Ryo Nakagaki Hiroki Kawada
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